High-Purity Carbon Dioxide
6N-grade high-purity carbon dioxide (99.9999%) for advanced manufacturing and precision applications: Semiconductor Cleaning: Supercritical CO₂ (scCO₂) combines low surface tension with strong penetration to help remove fine particles and organic residues while minimizing damage to delicate circuit structures. Precision Analysis: A stable mobile phase for supercritical fluid chromatography (SFC), supporting accurate and reproducible analysis. Biotechnology & Extraction: Enables the extraction of pharmaceutical ingredients and natural bioactive compounds without leaving conventional organic solvent residues.
Custom Gas Mixtures
We supply precision gas mixtures tailored to specific process and research requirements. Controlled blending and rigorous quality testing ensure consistent gas concentrations and reliable stability in every cylinder, supporting advanced manufacturing and scientific research.
Dry Ice Products
We supply clean, consistent dry ice in a range of sizes and specifications for temperature-controlled transport and industrial cleaning applications.
Dry Ice Blasting Services
Our dry ice blasting service uses compressed air to propel dry ice particles onto target surfaces. This water-free cleaning process removes stubborn grease, carbon deposits, hardened residues, and coatings while minimizing abrasion and leaving no secondary blasting-media waste.
Dry Ice Blasting Equipment
Our dry ice blasting equipment uses precision ice-feed technology to deliver high-velocity dry ice particles that remove grease, carbon buildup, paint, and adhesive residues. It provides an efficient, water-free cleaning solution for production equipment and industrial maintenance.
High-purity specialty gases are essential throughout semiconductor wafer fabrication, packaging, and testing, including photolithography, thin-film deposition, dry etching, and ion implantation. We support advanced semiconductor processes through consistent gas purity, quality control, and dependable supply.
| Process Name | Specialty Gases Used |
|---|---|
| Etching | HF, HCl, HBr, CF4, CHF3, CClF3, PH3, B2H6, SiH4, C3F8, SiF4, SF6, CBrF3, C2Cl2F4, C2H2, PH3, CCl2F2, Cl2 |
| Diffusion | AsH3, AsCl3, PH3, PCl3, POCl3, B2H6, BCl3, BBr3, SiCl4, SiH2Cl2, Cl2, NH3 |
| Ion Implantation | H2, BF3, PF5, SiF4, PF3, AsH3, B2H6, AsCl3, BCl3 |
| Chemical Vapor Deposition (CVD) | C2H2, CHF3, CF4, C2F6, He, SiH2Cl2, NH3, SiHCl3, SiCl4, NF3, SiF4, N2O, B2H6 |
| Chemical Vapor Deposition | SiH4, SiHCl3, SiH2Cl2, SiCl4, AsH3, AsCl3, PH3, B2H6 |
| Epitaxy | BCl3, SiHCl3, SiH2Cl2, BF3 |
| Oxidation | O2, H2O, N2O |
| Sputtering | Ar, N2, NH3 |
| Photoresist Stripping / Wafer Cleaning | CO2, CF4, O2, NF3 |
In the manufacture of precision electronic components, display panels, and optoelectronic devices, high-purity gases support controlled process atmospheres and chemical reactions. From oxidation prevention and thin-film deposition to system purging, we provide consistent gas quality and technical support for stable manufacturing operations.
Dry ice blasting is a water-free, nonconductive cleaning method used in precision manufacturing. High-velocity dry ice particles cool and loosen surface contaminants, while the particles sublimate into carbon dioxide gas. The process helps remove deposits with minimal abrasion and without leaving liquid water or spent blasting-media residue.
Dry ice is a key cooling medium for cold-chain logistics and temperature-controlled transport. Its low temperature enables passive cooling without onboard electrical power, helping maintain transport conditions for fresh foods, vaccines, and pharmaceuticals when used with suitable packaging and handling procedures. As dry ice sublimates directly into gas, it leaves no liquid water residue.
Beyond its use as dry ice, carbon dioxide is also used as R-744, a natural refrigerant in refrigeration and cooling systems. As environmental requirements evolve, CO₂-based technologies are playing a growing role in energy-efficient industrial applications and corporate sustainability initiatives.
Group History & Business Structure
Yung Tai Gas
Yung Tai Gas Industrial Co., Ltd. is the group’s core technology business, specializing in ultra-high-purity electronic-grade carbon dioxide (6N+ / 99.9999%+) and specialty gases for semiconductor applications. Our products support demanding processes such as wafer cleaning and advanced semiconductor manufacturing.
We operate dedicated production facilities in Taoyuan District and at our Haihu plant in Luzhu District. Our in-house fleet delivers dry ice in a variety of specifications to support food and biotechnology cold-chain operations. We also supply professional dry ice blasting equipment and blasting-grade dry ice, providing efficient industrial cleaning without wastewater or chemical cleaning agents.
Hsin Feng Carbonic
Established in 1990, Hsin Feng Carbonic specializes in industrial-grade carbon dioxide production and the distribution of large cryogenic storage tanks. Supported by a stable gas production base, the company provides dependable supply for industrial and conventional manufacturing customers.
Yung Feng Gas
Established in 1965, Yung Feng Gas laid the foundation for the group. With decades of industrial gas experience, the company specializes in manufacturing and supplying industrial-grade and high-purity acetylene for a wide range of applications.
Reliable Supply | Professional Service | Safety & Quality | Industry Experience
Our ISO 9001, ISO 14001, and HACCP certifications reflect our commitment to quality management, environmental responsibility, and food safety. Through standardized procedures and rigorous controls, we work to deliver consistent gas quality and dependable service.
Gas Analysis Laboratory
